Sputtering Targets for Optical Films
NS-5 Series
(High-Refractivity Target)
Features
Our proprietary high-refractivity target, offering the following features.
- High-refractivity, high-transmittance film can be deposited at a fast rate by DC sputtering.
As an alternative material to TiO2, it enables higher productivity and improvement of optical properties. - The target offers outstanding amorphous stability and barrier performance. It is suited for use as protective film of various kinds.
NS-5: For films with higher refractivity than TiO2 NS-5B: Deposition three times faster than TiO2
NS-5 Series basic properties
| Target | Ar+2%O2 | Sputtering rate (Å/sec) | Film resistivity (Ω/cm) | Crystallization temperature | |
|---|---|---|---|---|---|
| n@550nm | k@405nm | ||||
| NS-5 | 2.46 | 0.004 | 0.9 | >106 | ≧400℃ |
| NS-5B | 2.37 | 0.000 | 1.5 | >106 | >600℃ |
| TiO2 (for reference) |
2.37 | 0.001 | 0.5 | >106 | 300℃ |
NS-5 Series optical transmittance
Has similar transmittance to TiO2 in the visible light region.
NS-5 Series water vapor transmission rate (WVTR, measured by MOCON analyzer)
Barrier properties are superior to those of SiO2.
- Relative values with SiO2 (30 nm) as 1.
Contact Information
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